Chen, Yifang

Dr Yifang Chen has been dedicated to the research and development of nanotechnology since 1990. He received a D.Phil degree for his study in quantum transport in nanostructures/devices at the Clarendon Laboratory of Oxford University in 1995, where he was awarded an Arthur Cooke Memorial Prize for the most outstanding D.Phil student. Then he worked at the Applied Physics Department of Delft University of Technology for two years, at the Department of Electronics and Electrical Engineering at the University of Glasgow for five years. He has been appointed as a senior scientist at the Rutherford Appleton Laboratory in the UK from 2003, specialising in nanolithography and nanofabrications (electron beam lithography, nanoimprint lithography, hot embossing and reactive ion etch, etc.) for nanostructures/devices. Dr Chen's numerous achievements in nanofabrication include the world's shortest T gate. He was also the first to imprint 3D T gates using imprint lithography and fabricated world's first high electron mobility transistors (HEMTs) by imprint technique. His contributions in nanolithography for nanophotonic metamaterials have enabled scientists to make extraordinary discoveries in nanophotonic physics in recent years. His major research interests lie in nanotechnology and its applications in metamaterials, nanophotonics, biophotonics, and quantum nanodevices.